Summary
This module addresses a need within an important group of the ICMCTF community which uses cathodic arc technology to deposit thin films and coatings, often binary, ternary and complex nitrides or diamondlike carbon (of the t-C or ta-C type). They are typically hard to superhard, corrosion and wear resistant, and may also have decorative properties. In this module, the emphasis is on the arc plasma and the special effects arc plasma properties have on the coatings.
Topics
- Introduction by Recalling from First Module: electron emission relation to define glows and arcs, modes of arcs, arcing
- Cathodic arc plasma generation, arc plasma properties, ion fluxes, charge states, and energies
- Vacuum arcs versus cathodic arcs in gases, especially in reactive gases such as nitrogen and oxygen
- Arc Plasma Sources: DC, pulsed, steered arcs, arc triggering, cathode erosion
- Plasma Contamination with Macroparticles, Introduction to Plasma Filters: operational principles, properties, and limitations
- Energetic film deposition and subplantation growth mode, structure zone diagram
- Multielement plasma and the formation of multielement coatings
Instructor
André Anders
Plasma Engineering, LLC
Prof. Appl. Physics, formerly with Univ. Leipzig and Director of Leibniz IOM, Leipzig, Germany
Former Editor-in-Chief, Journal of Applied Physics, AIP Publishing Melville, NY
