Summary
The addition of a reactive gas such as oxygen or nitrogen strongly affect the discharge properties and the film growth. This module focuses on the several features of this process.
Topics
- Definition of reactive sputtering
- Hysteresis experiments
- Modelling of the process curve
- Target poisoning
- Avoiding abrupt changes
- Feedback control
Instructor
Diederik Depla
Professor, Head of Research Group
Dedicated Research on Advanced Films and Targets (DRAFT)
Ghent University
