Summary
The module will provide a robust footing for the understanding of film growth and surface modification in a HIPIMS environment. The development of the morphology of thin films and their crystallographic texture is considered in relation to metal ionization and in the context of reactive gas dissociation events. This technology is seen as enabling for efficient self- ion etching and self ion-assisted film deposition on large areas or batches of substrates. The module shows examples of HIPIMS coatings such as complex nitrides for hard and wear-resistant coatings, oxides for photocatalytic and biomedical applications and metal coatings for microelectronics and particle accelerators.
Topics
- HIPIMS: Definition and Motivation
- Film growth with ion assistance
- Energetic Deposition
- HIPIMS Discharge and Plasmas
- Plasma species and energies
- Pretreatment by HIPIMS
- Formation of ion implantation profiles
- Metal ion implantation
- Coating- substrate interface microstructure
- Thin Film Deposition by HIPIMS
- Film growth: texture and microstructure evolution in metals and nitrides
- Low Pressure Plasma Nitriding with HIPIMS
- Industrial implementation of HIPIMS coatings
Instructor
Arutiun Ehiasarian
Head of National HIPIMS Technology Centre
Director of the Joint SHU-Fraunhofer IST HIPIMS Research Centre
Sheffield Hallam University, UK
